Armando António Cardoso Dos Santos Lourenço

Professor Auxiliar

Perfil biográfico

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Principais colaboradores

Actividade pedagógica

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Publicações seleccionadas

Publicações

Effect of lattice mismatch on the magnetic properties of nanometer-thick La0.9Ba0.1MnO3 (LBM) films and LBM/BaTiO3/LBM heterostructures

Vaghefi, PM; Baghizadeh, A; Willinger, M; Lourenco, AACS; Amaral, VS
2017, APPLIED SURFACE SCIENCE, 425, 988-995.

Interdiffusion Processes in High-Coercivity RF-Sputtered Alnico Thin Films on Si Substrates

Mohseni, F; Baghizadeh, A; Lourenco, AACS; Pereira, MJ; Amaral, VS; Vieira, JM; Amaral, JS
2017, JOM, 69, 8, 1427-1431.

Giant Strain and Induced Ferroelectricity in Amorphous BaTiO3 Films under Poling

Vaghefi, PM; Baghizadeh, A; Lourenco, AACS; Amaral, VS; Kholkin, AL
2017, MATERIALS, 10, 9.

The Role of Edge Dislocations on the Red Luminescence of ZnO Films Deposited by RF-Sputtering

Felix, R; Peres, M; Magalhaes, S; Correia, MR; Lourenco, A; Monteiro, T; Garcia, R; Morales, FM
2015, JOURNAL OF NANOMATERIALS.

Structural and Electromagnetic Properties of Ni-Mn-Ga Thin Films Deposited on Si Substrates

Pereira, MJ; Lourenco, AACS; Amaral, VS
2014, JEMS 2013 - JOINT EUROPEAN MAGNETIC SYMPOSIA, 75.

Disorder induced violet/blue luminescence in rf-deposited ZnO films

Peres, M; Magalhaes, S; Soares, MR; Soares, MJ; Rino, L; Alves, E; Lorenz, K; Correia, MR; Lourenco, AC; Monteiro, T
2013, PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 10, NO 4, 10, 4, 662-666.

Magnetoelectric coupling in multiferroic heterostructure of rf-sputtered Ni-Mn-Ga thin film on PMN-PT

Teferi, MY; Amaral, VS; Lounrenco, AC; Das, S; Amaral, JS; Karpinsky, DV; Soares, N; Sobolev, NA; Kholkin, AL; Tavares, PB
2012, JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 324, 11, 1872-1876.

Magnesium metallic interlayer as an oxygen-diffusion-barrier between high-kappa dielectric thin films and silicon substrate

Rauwel, E; Rauwel, P; Ducroquet, F; Sunding, MF; Matko, I; Lourenco, AC
2012, THIN SOLID FILMS, 520, 17, 5602-5609.

Metallic oxygen barrier diffusion applied to high-kappa deposition

Rauwei, E; Rauwel, P; Ducroquet, F; Matko, I; Lourenco, AC
2011, JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 29, 1.

Oxygen Diffusion Barrier Applied To High-k Thin Films Deposition

Rauwel, E; Rauwel, P; Ducroquet, F; Matko, I; Lourenco, A
2010, PHYSICS AND TECHNOLOGY OF HIGH-K MATERIALS 8, 33, 3, 497-506.
ISBN: 978-1-60768-172-4

Patentes

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