Pulsed injection metal organic chemical vapour deposition and characterisation of thin CaO films

abstract

Thin films of CaO were grown on silicon (Si) and lanthanum aluminate (LaAIO(3)) substrates by pulsed injection metal-organic chemical vapour deposition in a vertical injection MOCVD system. Growth parameters were systematically varied to study their effect on film growth and quality and to determine the optimal growth conditions for this material. Film quality and growth rate were evaluated by atomic force microscopy, X-ray diffraction and Rutherford Backscattering Spectroscopy measurements. Optimised conditions allowed growing transparent, single phase films textured along the (001) direction. (C) 2009 Elsevier B.V. All rights reserved.

keywords

MOCVD; DECOMPOSITION; GROWTH; OXIDES; MGO

subject category

Physics

authors

Borges, RP; Ferreira, P; Saraiva, A; Goncalves, R; Rosa, MA; Goncalves, AP; da Silva, RC; Magalhaes, S; Lourenco, MJV; Santos, FJV; Godinho, M

our authors

acknowledgements

This work was financed by the Portuguese Foundation for Science and Technology (FCT) through project PPCDT/FIS/60153/2004.

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