abstract
A Taguchi Matrix was used for the experimental design to study the CVD diamond deposition parameters in a cold-wall HFCVD reactor. Gas composition, total gas pressure, total mass flow and substrate temperature were considered as controllable factors, and three levels for each of these factors were selected, in an L9 orthogonal array. A new Figure-of-Merit (FOM) is proposed to assess the best combination of film properties: grain size, residual stress, structural quality and growth rate. Substrate temperature affects mostly grain size and diamond quality, while methane content mostly determines residual stresses and the growth rate. The latter is also mainly affected by the total pressure as well as is grain size, while total gas flow has a neutral effect. Under the limits of deposition conditions, the best FOM is obtained at the highest total gas pressure and mass flow, average CH4 content, and lowest substrate temperature. (C) 2010 Elsevier Ltd. All rights reserved.
keywords
HOT-FILAMENT CVD; FILMS; SYSTEM; PRESSURE; QUALITY; GROWTH
subject category
Materials Science; Physics
authors
Salgueiredo, E; Amaral, M; Neto, MA; Fernandes, AJS; Oliveira, FJ; Silva, RF
our authors
Ermelinda da Conceição Portela Salgueiredo
PhD Student
Filipe José Alves de Oliveira
Principal Research Associate
Miguel Ângelo da Costa Neto
Researcher
Rui Ramos Ferreira e Silva
Associate Professoracknowledgements
E. Salgueiredo, M. Amaral and M.A. Neto acknowledge FCT for the grants SFRH/BD/41757/2007, SFRH/BPD/26787/2006 and SFRH/BPD/45610/2008, respectively.